RefractiveIndex.INFO

Refractive index database

nk database   |   n2 database   |   about

Shelf

Book

Page

Optical constants of Si-O (Non-stoichiometric silicon oxide)
Herguedas and Carretero 2023: SiO0.31; n,k 5.0–25 µm

Wavelength: µm
 (5.000–25.000)  
 

Complex refractive index (n+ik)[ i ]


n   k   LogX   LogY   eV

Derived optical constants

Conditions & Spec sheet

n_is_absolute: true
wavelength_is_vacuum: true

Comments

SiO0.31. Sputtered Si with 10 sccm O2 and 190 sccm Ar, which is equivalent to a oxygen partial pressure of 1.1 × 10-4 mbar and a total pressure of 1.8 × 10-3 mbar. Room temperature.

References

N. Herguedas and E. Carretero. Optical properties in mid-infrared range of silicon oxide thin films with different stoichiometries, Nanomaterials 13, 2749 (2023)

Data

[CSV - comma separated]   [TXT - tab separated]   [Full database record]

INFO

Non-stoichiometric silicon oxide (SiOx)

Nonstoichiometric silicon oxide (SiOx) holds a significant place in diverse technological and scientific domains. Its composition isn't fixed, indicated by the 'x' in the formula, which underscores the variability in oxygen content. This inherent flexibility enables a customization of properties, yielding materials with tailored electrical, optical, and physical characteristics. In contexts spanning from optics to microelectronics, SiOx is valued for its adaptable refractive indices and electrical behaviors, making it a versatile material in the manufacturing of sensors, waveguides, and various other devices. The ability to precisely control its nonstoichiometric composition via advanced fabrication and treatment methods underpins its widespread applicability. From semiconductor technologies to advanced coatings and an array of other applications, SiOx continues to be instrumental due to its customizable and diverse property profile.

External links