Optical constants of SiO2 (Silicon dioxide, Silica, Quartz)
Kischkat et al. 2012: Thin film; n,k 1.54–14.3 µm
Wavelength:
µm
(1.53846–14.28571)
Complex refractive index (n+ik)
n
k
LogX
LogY
eV
Derived optical constants
Comments
510-nm single layer on Si substrate. Prepared by room temperature reactive sputter deposition using Si target and 2.0 SCCM O2 flux.
Data on the influence of deposition conditions on the optical properties of the film can be found in the original publication.
Data on the refractive index (n) in the visible can be found in the original publication.
References
J. Kischkat, S. Peters, B. Gruska, M. Semtsiv, M. Chashnikova, M. Klinkmüller, O. Fedosenko, S. Machulik, A. Aleksandrova, G. Monastyrskyi, Y. Flores, and W. T. Masselink. Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride, Appl. Opt. 51, 6789-6798 (2012) (Numerical data kindly provided by Jan Kischkat)
Data
INFO
Silicon dioxide, SiO2
Other names
- Quartz
- Silica
- Silicon oxide
- Silicon(IV) dioxide
Polymorphs
- Alpha quartz (α-quartz, most common)
- Beta quartz (β-quartz, only stable at temperatures above 573 °C)
- Tridymite
- Cristobalite
- Coesite
- Stishovite
- Lechatelierite
- Chalcedony