Optical constants of Si3N4, SiN (Silicon nitride)
Beliaev et al. 2022: Non-stoichiometric SiN; n,k 0.21-1.7 µm
Complex refractive index (n+ik)
Derived optical constants
Conditions & Spec sheet
film_thickness: 100 nm substrate: Si
100 nm thick film deposited by plasma-enchased CVD with certain recipe as an example. Optical properties of SiN films produced by different deposition methods and process parameters can be found in the reference.
L. Yu. Beliaev, E. Shkondin, A. V. Lavrinenko, O. Takayama. Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor deposition, Thin Solid Films 763, 139568 (2022) (Numerical data kindly provided by Osamu Takayama)