Refractive index database

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Optical constants of Si3N4, SiN (Silicon nitride)
Beliaev et al. 2022: Non-stoichiometric SiN; n,k 0.21-1.7 µm

Wavelength: µm

Complex refractive index (n+ik)[ i ]

n   k   LogX   LogY   eV

Derived optical constants

Conditions & Spec sheet

film_thickness: 100e-9
substrate: Si


100 nm thick film deposited by plasma-enchased CVD with certain recipe as an example. Optical properties of SiN films produced by different deposition methods and process parameters can be found in the reference.


L. Yu. Beliaev, E. Shkondin, A. V. Lavrinenko, O. Takayama. Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor deposition, Thin Solid Films 763, 139568 (2022) (Numerical data kindly provided by Osamu Takayama)


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Silicon nitride, Si3N4

Silicon nitride (Si3N4) is a synthetic, high-performance ceramic material known for its impressive mechanical properties even at elevated temperatures. It exhibits excellent thermal shock resistance, and its hardness makes it resistant to wear and abrasion. In the realm of electronics, it's utilized as an insulator and as a dielectric for advanced microelectronics applications due to its electrical properties. Owing to its resistance to oxidation and chemical corrosion, it's also used in challenging environments, such as in the manufacturing of ball bearings, turbine blades, and other engine components. Additionally, in the optical domain, silicon nitride is transparent in the infrared range and has been studied for potential uses in optoelectronic devices. Its combination of strength, temperature resistance, and electrical properties make it a sought-after material for various high-tech applications.

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