Optical constants of HfO2 (Hafnium dioxide, Hafnia)
Bright et al. 2012: n,k 0.385–500 µm
Wavelength:
µm
(3.8462e-01–5.0000e+02)
Complex refractive index (n+ik)
n
k
LogX
LogY
eV
Derived optical constants
Conditions & Spec sheet
substrate: Si
Comments
Thin hafnia films of thicknesses from about 180 to 500 nm deposited on Si substrates using reactive magnetron sputtering.
References
T. J. Bright, J. I. Watjen, Z. M. Zhang, C. Muratore, A. A. Voevodin. Optical properties of HfO2 thin films deposited by magnetron sputtering: From the visible to the far-infrared. Thin Solid Films 520, 6793–6802 (2012)
[Calculation script (Python)]
Data
INFO
Hafnium dioxide, HfO2
Hafnium dioxide (HfO2) is a high-index, low-absorption material used extensively in optical applications. It is especially valuable for making thin-film dielectric coatings for mirrors, anti-reflective coatings, and beam splitters. Due to its excellent thermal stability and resistance to chemical corrosion, it is well-suited for harsh environments. Additionally, its high refractive index makes it an attractive material for planar waveguides and other integrated optics components. Beyond its optical uses, hafnium dioxide is also a key material in the fabrication of advanced gate dielectrics in field-effect transistors, contributing to the miniaturization and performance improvement of electronic devices.Other names
- Hafnia
- Hafnium(IV) oxide
- Hafnium oxide