Optical constants of HfO2 (Hafnium dioxide, Hafnia)
Al-Kuhaili 2004: n 0.2–2.0 µm
Complex refractive index (n+ik)
n k LogX LogY eV
Derived optical constants
Thin films of hafnium oxide deposited by electron beam evaporation.
M. F. Al-Kuhaili. Optical properties of hafnium oxide thin films and their application in energy-efficient windows. Opt. Mat. 27, 383-387 (2004)
Hafnium dioxide, HfO2Hafnium dioxide (HfO2) is a high-index, low-absorption material used extensively in optical applications. It is especially valuable for making thin-film dielectric coatings for mirrors, anti-reflective coatings, and beam splitters. Due to its excellent thermal stability and resistance to chemical corrosion, it is well-suited for harsh environments. Additionally, its high refractive index makes it an attractive material for planar waveguides and other integrated optics components. Beyond its optical uses, hafnium dioxide is also a key material in the fabrication of advanced gate dielectrics in field-effect transistors, contributing to the miniaturization and performance improvement of electronic devices.
- Hafnium(IV) oxide
- Hafnium oxide