Optical constants of HfO2 (Hafnium dioxide, Hafnia)
Siefke et al. 2026: Thin film; n,k 0.124–0.620 µm
Complex refractive index (n+ik)
Derived optical constants
Conditions
film_thickness: 2.2E-7 substrate: SiO2
Comments
HfO2 thin films deposited by plasma-enhanced atomic layer deposition (PEALD)
References
T. Siefke, K. Gerold, S. Shestaeva, P. Paul, S. Alam, D. Franta, A. Szeghalmi, S. Schröder, S. Kroker. Atomic layer deposition for hafnium oxide-based meta-optics in the ultraviolet spectral range. J. Eur. Opt. Society-Rapid Publ. 22, 33 (2026) (Numerical data kindly provided by Thomas Siefke)
Data
Additional information
About Hafnium dioxide
Hafnium dioxide (HfO2) is a high-index, low-absorption material used extensively in optical applications. It is especially valuable for making thin-film dielectric coatings for mirrors, anti-reflective coatings, and beam splitters. Due to its excellent thermal stability and resistance to chemical corrosion, it is well-suited for harsh environments. Additionally, its high refractive index makes it an attractive material for planar waveguides and other integrated optics components. Beyond its optical uses, hafnium dioxide is also a key material in the fabrication of advanced gate dielectrics in field-effect transistors, contributing to the miniaturization and performance improvement of electronic devices.
Other names and variations:- HfO2
- Hafnia
- Hafnium(IV) oxide
- Hafnium oxide