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Optical constants of HfO2 (Hafnium dioxide, Hafnia)
Franta et al. 2015: n,k 0.115–125 µm

Wavelength: µm
 (0.114773–125.124)  
 

Complex refractive index (n+ik)[ i ]


n   k   LogX   LogY   eV

Derived optical constants

Conditions

film_thickness: 1.127E-7
substrate: c-Si

Comments

Film HfO2; Deposited by e-beam evaporation on c-Si; 112.7 nm thick film with an amorphous (very fine polycrystalline) structure; Heterogenous data processing combining ellipsometric and spectrophotometric measurements; Room temperature.

References

D. Franta, D. Nečas, I. Ohlídal. Universal dispersion model for characterization of optical thin films over wide spectral range: Application to hafnia. Appl. Opt. 54, 9108–9119 (2015) (Numerical data kindly provided by Daniel Franta)

Data

[CSV - comma separated]   [TXT - tab separated]   [Full database record]

Additional information

About Hafnium dioxide

Hafnium dioxide (HfO2) is a high-index, low-absorption material used extensively in optical applications. It is especially valuable for making thin-film dielectric coatings for mirrors, anti-reflective coatings, and beam splitters. Due to its excellent thermal stability and resistance to chemical corrosion, it is well-suited for harsh environments. Additionally, its high refractive index makes it an attractive material for planar waveguides and other integrated optics components. Beyond its optical uses, hafnium dioxide is also a key material in the fabrication of advanced gate dielectrics in field-effect transistors, contributing to the miniaturization and performance improvement of electronic devices.

Other names and variations:
  • HfO2
  • Hafnia
  • Hafnium(IV) oxide
  • Hafnium oxide
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