Optical constants of HfO2 (Hafnium dioxide, Hafnia)
Franta et al. 2015: n,k 0.115–125 µm
Complex refractive index (n+ik)
Derived optical constants
Conditions
film_thickness: 1.127E-7 substrate: c-Si
Comments
Film HfO2; Deposited by e-beam evaporation on c-Si; 112.7 nm thick film with an amorphous (very fine polycrystalline) structure; Heterogenous data processing combining ellipsometric and spectrophotometric measurements; Room temperature.
References
D. Franta, D. Nečas, I. Ohlídal. Universal dispersion model for characterization of optical thin films over wide spectral range: Application to hafnia. Appl. Opt. 54, 9108–9119 (2015) (Numerical data kindly provided by Daniel Franta)
Data
Additional information
About Hafnium dioxide
Hafnium dioxide (HfO2) is a high-index, low-absorption material used extensively in optical applications. It is especially valuable for making thin-film dielectric coatings for mirrors, anti-reflective coatings, and beam splitters. Due to its excellent thermal stability and resistance to chemical corrosion, it is well-suited for harsh environments. Additionally, its high refractive index makes it an attractive material for planar waveguides and other integrated optics components. Beyond its optical uses, hafnium dioxide is also a key material in the fabrication of advanced gate dielectrics in field-effect transistors, contributing to the miniaturization and performance improvement of electronic devices.
Other names and variations:- HfO2
- Hafnia
- Hafnium(IV) oxide
- Hafnium oxide