3.96-nm monolayer deposited using the magnetron sputtering technique; thicknesses determined by X-ray diffraction.
F. Lemarchand, private communications (2013). Index determination is performed using method explained in:
L. Gao, F. Lemarchand, and M. Lequime. Comparison of different dispersion models for single layer optical thin film index determination, Thin Solid Films 520, 501-509 (2011)